diff options
author | Brian Osman <brianosman@google.com> | 2017-11-14 16:16:39 +0000 |
---|---|---|
committer | Skia Commit-Bot <skia-commit-bot@chromium.org> | 2017-11-14 16:16:45 +0000 |
commit | 3e31e99babe3a6776d345f433d6966ef444d640b (patch) | |
tree | 3ebd70dbc3ac1b9f2d6cca0a32123015e242cebc /include | |
parent | 8073e79e5b8c7dab129112e4494b907b175b7217 (diff) |
Revert "Alloc glyph image correctly for SkMask::k3D_Format."
This reverts commit 1662257bdaaaf26b016bf2a3e329c34f7f5ed581.
Reason for revert: Android still using this API
Original change's description:
> Alloc glyph image correctly for SkMask::k3D_Format.
>
> Remove the no longer used outside Skia SK_SUPPORT_LEGACY_EMBOSSMASKFILTER
> define, and either delete the code it guards or update it to use the new
> emboss mask filter factory.
>
> Re-enable the code to test the emboss mask filter.
>
> Add a test to ensure that embossed text is drawn correctly, as before
> glyphs did not allocate the proper amount of memory for the k3D_Format
> which the emboss mask filter produces.
>
> Fixes SkEmbossMask::Emboss to write the whole of the mul and add planes
> to avoid pixel differences and MemorySanitizer errors.
>
> Update the GPU to understand the k3D_Format and use just the alpha
> plane, ignoring the mul and add plane which it currently cannot support.
>
> Change-Id: Icac1a3f37d6e8c6be3151df570f5e14111e18585
> Reviewed-on: https://skia-review.googlesource.com/70260
> Reviewed-by: Herb Derby <herb@google.com>
> Reviewed-on: https://skia-review.googlesource.com/70962
> Commit-Queue: Ben Wagner <bungeman@google.com>
TBR=djsollen@google.com,bungeman@google.com,herb@google.com
Change-Id: Id6625bae8d3bd70ce7aa3045348c04fdd146c637
No-Presubmit: true
No-Tree-Checks: true
No-Try: true
Reviewed-on: https://skia-review.googlesource.com/71183
Reviewed-by: Brian Osman <brianosman@google.com>
Commit-Queue: Brian Osman <brianosman@google.com>
Diffstat (limited to 'include')
-rw-r--r-- | include/effects/SkBlurMaskFilter.h | 13 |
1 files changed, 13 insertions, 0 deletions
diff --git a/include/effects/SkBlurMaskFilter.h b/include/effects/SkBlurMaskFilter.h index e000732a85..8b032e50ee 100644 --- a/include/effects/SkBlurMaskFilter.h +++ b/include/effects/SkBlurMaskFilter.h @@ -48,6 +48,19 @@ public: return Make(style, sigma, SkRect::MakeEmpty(), flags); } +#ifdef SK_SUPPORT_LEGACY_EMBOSSMASKFILTER + /** Create an emboss maskfilter + @param blurSigma standard deviation of the Gaussian blur to apply + before applying lighting (e.g. 3) + @param direction array of 3 scalars [x, y, z] specifying the direction of the light source + @param ambient 0...1 amount of ambient light + @param specular coefficient for specular highlights (e.g. 8) + @return the emboss maskfilter + */ + static sk_sp<SkMaskFilter> MakeEmboss(SkScalar blurSigma, const SkScalar direction[3], + SkScalar ambient, SkScalar specular); +#endif + static const int kMaxDivisions = 6; // This method computes all the parameters for drawing a partially occluded nine-patched |