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authorGravatar Ben Wagner <bungeman@google.com>2017-11-13 20:41:14 +0000
committerGravatar Skia Commit-Bot <skia-commit-bot@chromium.org>2017-11-13 20:43:06 +0000
commit3ae1a307f61ea15cfd0fafded64a4405deba0dba (patch)
tree6d3301566c471259f53ca69c4e7dbd44168338ab /include/effects
parent5254ccc1815e1b1bfa066a1ce193ddfdfcf16a55 (diff)
Revert "Alloc glyph image correctly for SkMask::k3D_Format."
This reverts commit 6b26deb8d6067589ce9b7853ab8e8d39de1a45de. Reason for revert: GPU bots failing Original change's description: > Alloc glyph image correctly for SkMask::k3D_Format. > > This removes the no longer used outside Skia > SK_SUPPORT_LEGACY_EMBOSSMASKFILTER define, and either deletes the code > it guards or updates it to use the new emboss mask filter factory. This > re-enables the code to test the emboss mask filter. Also added is a test > to ensure that embossed text is drawn correctly, as before this glyphs > did not allocate the proper amount of memory for the k3D_Format which > this mask filter produces. This also fixes SkEmbossMask::Emboss to write > the whole of the mul and add planes to avoid pixel differences and > MemorySanitizer errors. > > Change-Id: Ib492c72a19d6a27d140e3cd48179a3ca9ce313f5 > Reviewed-on: https://skia-review.googlesource.com/70260 > Commit-Queue: Ben Wagner <bungeman@google.com> > Reviewed-by: Herb Derby <herb@google.com> TBR=djsollen@google.com,bungeman@google.com,herb@google.com,reed@google.com Change-Id: I8a9db6c00e0cb84bdd4833474a9ffffa6ecc606c No-Presubmit: true No-Tree-Checks: true No-Try: true Reviewed-on: https://skia-review.googlesource.com/70920 Reviewed-by: Ben Wagner <bungeman@google.com> Commit-Queue: Ben Wagner <bungeman@google.com>
Diffstat (limited to 'include/effects')
-rw-r--r--include/effects/SkBlurMaskFilter.h13
1 files changed, 13 insertions, 0 deletions
diff --git a/include/effects/SkBlurMaskFilter.h b/include/effects/SkBlurMaskFilter.h
index e000732a85..8b032e50ee 100644
--- a/include/effects/SkBlurMaskFilter.h
+++ b/include/effects/SkBlurMaskFilter.h
@@ -48,6 +48,19 @@ public:
return Make(style, sigma, SkRect::MakeEmpty(), flags);
}
+#ifdef SK_SUPPORT_LEGACY_EMBOSSMASKFILTER
+ /** Create an emboss maskfilter
+ @param blurSigma standard deviation of the Gaussian blur to apply
+ before applying lighting (e.g. 3)
+ @param direction array of 3 scalars [x, y, z] specifying the direction of the light source
+ @param ambient 0...1 amount of ambient light
+ @param specular coefficient for specular highlights (e.g. 8)
+ @return the emboss maskfilter
+ */
+ static sk_sp<SkMaskFilter> MakeEmboss(SkScalar blurSigma, const SkScalar direction[3],
+ SkScalar ambient, SkScalar specular);
+#endif
+
static const int kMaxDivisions = 6;
// This method computes all the parameters for drawing a partially occluded nine-patched