diff options
author | Ben Wagner <bungeman@google.com> | 2017-11-13 20:41:14 +0000 |
---|---|---|
committer | Skia Commit-Bot <skia-commit-bot@chromium.org> | 2017-11-13 20:43:06 +0000 |
commit | 3ae1a307f61ea15cfd0fafded64a4405deba0dba (patch) | |
tree | 6d3301566c471259f53ca69c4e7dbd44168338ab /include/effects | |
parent | 5254ccc1815e1b1bfa066a1ce193ddfdfcf16a55 (diff) |
Revert "Alloc glyph image correctly for SkMask::k3D_Format."
This reverts commit 6b26deb8d6067589ce9b7853ab8e8d39de1a45de.
Reason for revert: GPU bots failing
Original change's description:
> Alloc glyph image correctly for SkMask::k3D_Format.
>
> This removes the no longer used outside Skia
> SK_SUPPORT_LEGACY_EMBOSSMASKFILTER define, and either deletes the code
> it guards or updates it to use the new emboss mask filter factory. This
> re-enables the code to test the emboss mask filter. Also added is a test
> to ensure that embossed text is drawn correctly, as before this glyphs
> did not allocate the proper amount of memory for the k3D_Format which
> this mask filter produces. This also fixes SkEmbossMask::Emboss to write
> the whole of the mul and add planes to avoid pixel differences and
> MemorySanitizer errors.
>
> Change-Id: Ib492c72a19d6a27d140e3cd48179a3ca9ce313f5
> Reviewed-on: https://skia-review.googlesource.com/70260
> Commit-Queue: Ben Wagner <bungeman@google.com>
> Reviewed-by: Herb Derby <herb@google.com>
TBR=djsollen@google.com,bungeman@google.com,herb@google.com,reed@google.com
Change-Id: I8a9db6c00e0cb84bdd4833474a9ffffa6ecc606c
No-Presubmit: true
No-Tree-Checks: true
No-Try: true
Reviewed-on: https://skia-review.googlesource.com/70920
Reviewed-by: Ben Wagner <bungeman@google.com>
Commit-Queue: Ben Wagner <bungeman@google.com>
Diffstat (limited to 'include/effects')
-rw-r--r-- | include/effects/SkBlurMaskFilter.h | 13 |
1 files changed, 13 insertions, 0 deletions
diff --git a/include/effects/SkBlurMaskFilter.h b/include/effects/SkBlurMaskFilter.h index e000732a85..8b032e50ee 100644 --- a/include/effects/SkBlurMaskFilter.h +++ b/include/effects/SkBlurMaskFilter.h @@ -48,6 +48,19 @@ public: return Make(style, sigma, SkRect::MakeEmpty(), flags); } +#ifdef SK_SUPPORT_LEGACY_EMBOSSMASKFILTER + /** Create an emboss maskfilter + @param blurSigma standard deviation of the Gaussian blur to apply + before applying lighting (e.g. 3) + @param direction array of 3 scalars [x, y, z] specifying the direction of the light source + @param ambient 0...1 amount of ambient light + @param specular coefficient for specular highlights (e.g. 8) + @return the emboss maskfilter + */ + static sk_sp<SkMaskFilter> MakeEmboss(SkScalar blurSigma, const SkScalar direction[3], + SkScalar ambient, SkScalar specular); +#endif + static const int kMaxDivisions = 6; // This method computes all the parameters for drawing a partially occluded nine-patched |