diff options
| author |  Ben Wagner <bungeman@google.com> | 2017-11-10 16:24:50 -0500 |
|---|---|---|
| committer |  Skia Commit-Bot <skia-commit-bot@chromium.org> | 2017-11-14 14:10:22 +0000 |
| commit | 1662257bdaaaf26b016bf2a3e329c34f7f5ed581 (patch) | |
| tree | a4f56bb7d0d0ec073e25d494d786637ea3a20a90 /include/effects | |
| parent | 5b65a84b990e4ed3b5534cd85167cdc3ed6c820a (diff) | |
Alloc glyph image correctly for SkMask::k3D_Format.
Remove the no longer used outside Skia SK_SUPPORT_LEGACY_EMBOSSMASKFILTER
define, and either delete the code it guards or update it to use the new
emboss mask filter factory.
Re-enable the code to test the emboss mask filter.
Add a test to ensure that embossed text is drawn correctly, as before
glyphs did not allocate the proper amount of memory for the k3D_Format
which the emboss mask filter produces.
Fixes SkEmbossMask::Emboss to write the whole of the mul and add planes
to avoid pixel differences and MemorySanitizer errors.
Update the GPU to understand the k3D_Format and use just the alpha
plane, ignoring the mul and add plane which it currently cannot support.
Change-Id: Icac1a3f37d6e8c6be3151df570f5e14111e18585
Reviewed-on: https://skia-review.googlesource.com/70260
Reviewed-by: Herb Derby <herb@google.com>
Reviewed-on: https://skia-review.googlesource.com/70962
Commit-Queue: Ben Wagner <bungeman@google.com>
Diffstat (limited to 'include/effects')
| -rw-r--r-- | include/effects/SkBlurMaskFilter.h | 13 |
1 files changed, 0 insertions, 13 deletions
diff --git a/include/effects/SkBlurMaskFilter.h b/include/effects/SkBlurMaskFilter.h index 8b032e50ee..e000732a85 100644 --- a/include/effects/SkBlurMaskFilter.h +++ b/include/effects/SkBlurMaskFilter.h @@ -48,19 +48,6 @@ public: return Make(style, sigma, SkRect::MakeEmpty(), flags); } -#ifdef SK_SUPPORT_LEGACY_EMBOSSMASKFILTER - /** Create an emboss maskfilter - @param blurSigma standard deviation of the Gaussian blur to apply - before applying lighting (e.g. 3) - @param direction array of 3 scalars [x, y, z] specifying the direction of the light source - @param ambient 0...1 amount of ambient light - @param specular coefficient for specular highlights (e.g. 8) - @return the emboss maskfilter - */ - static sk_sp<SkMaskFilter> MakeEmboss(SkScalar blurSigma, const SkScalar direction[3], - SkScalar ambient, SkScalar specular); -#endif - static const int kMaxDivisions = 6; // This method computes all the parameters for drawing a partially occluded nine-patched |