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author | Ben Wagner <bungeman@google.com> | 2017-11-10 16:24:50 -0500 |
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committer | Skia Commit-Bot <skia-commit-bot@chromium.org> | 2017-11-13 20:26:21 +0000 |
commit | 6b26deb8d6067589ce9b7853ab8e8d39de1a45de (patch) | |
tree | 831d213954cf73c939850b9650f186c18e459dce /example | |
parent | 0030c5ed3ca61b195bc58cfb70a16c57319c6e41 (diff) |
Alloc glyph image correctly for SkMask::k3D_Format.
This removes the no longer used outside Skia
SK_SUPPORT_LEGACY_EMBOSSMASKFILTER define, and either deletes the code
it guards or updates it to use the new emboss mask filter factory. This
re-enables the code to test the emboss mask filter. Also added is a test
to ensure that embossed text is drawn correctly, as before this glyphs
did not allocate the proper amount of memory for the k3D_Format which
this mask filter produces. This also fixes SkEmbossMask::Emboss to write
the whole of the mul and add planes to avoid pixel differences and
MemorySanitizer errors.
Change-Id: Ib492c72a19d6a27d140e3cd48179a3ca9ce313f5
Reviewed-on: https://skia-review.googlesource.com/70260
Commit-Queue: Ben Wagner <bungeman@google.com>
Reviewed-by: Herb Derby <herb@google.com>
Diffstat (limited to 'example')
0 files changed, 0 insertions, 0 deletions